China factory high quality 200mm silicon ingot 8 inch monocrystalline silicon ingot
- $127.00 / >=17 kilograms
- 17 kilograms
- Wuxi Pango Semiconductor Technology Co., Ltd.
- Jiangsu, China
- Mr James
PRODUCT DETAIL
| grade: | 9N (99.9999999%) | purity: | ≥9N |
| Types of: | Part Number | Dopant: | Boron/As/Phosphorus |
| Material: | High-purity polysilicon material | application: | Grade Polished Silicon Wafer/Optical Lens/Mirror/Oxide Wafer |
| Package preview: | place of origin; place of origin: | Jiangsu, China | |
| Steel ingot processing technology: | CZ and MCZ | model: | PG-28 |
| payment terms: | L/C, T/T | Resistivity: | 0.0001-120 ohm.cm |
| density: | 2.33 g/cm3 |
Product Description
Silicon ingots are key components in the semiconductor and optics industries. PGO TECH offers a variety of standard 200mm ingot options, also known as 8” ingots/8” ingots, for a wide range of applications. PGO TECH stocks a large selection of P<100>, N<100>, P<111> and N<111> types and orientations of 200mm silicon wafers in stock. Below are some samples of silicon ingots we currently stock. Also, we are committed to meeting customers' special specifications or standard requirements.
General Specifications | ||||||||
diameter | Types of | dopant | direction | Resistivity (ohm-cm) | ||||
200mm | Part Number | Boron/Phosphorus/As | <100>/<111> | 0.0006-200 | ||||
Sample Specifications | ||||||||
diameter | Types of | dopant | direction | Resistivity (ohm-cm) | ||||
200mm | P | boron | <100> | 6-18 | ||||
200mm | P | antimony | <100> | 0.01-0.02 | ||||
200mm | P | boron | <100> | 1-5 | ||||
200mm | P | boron | <111> | 0.001-0.005 | ||||
200mm | P | boron | <100> | 1-50 | ||||
200mm | P | boron | <100> | 3-12 | ||||
200mm | no | phosphorus | <100> | 1-10 | ||||
200mm | P | boron | <111> | 0.001-1 | ||||
Law
Generally, this is the most widely used method in long ingot machining. Oxygen dissolution in quartz glass (SiO2) is unavoidable because the molten silicon feedstock is contained in a quartz crucible; as a result, the method maintains the oxygen standard content.
Research on MCZ method
In the MCZ method, two magnetic fields facing each other are called cusp magnetic fields. The cusp magnetic fields used for analysis are external magnetic field, surface magnetic field and internal magnetic field. Furthermore, the analysis was performed using a direct magnetic field. The results of our analysis are compared with those of Watanabe's experiments. The velocity field, temperature field and electromagnetic field are checked and compared with the calculated results. Each case was further examined centering on degree of agitation, axial symmetry, and flow stability.
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